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Equipment & Facilities

Deposition & Synthesis

Anric AT200M ALD reactor, Room 360

Anric AT200M ALD Reactor

Room 360 · Anric Technologies · Four-port configuration

A compact benchtop system for atomic layer deposition, using sequential reactant pulses and inert-gas purging to grow thin films.

Process
Atomic layer deposition (ALD)
Reactant ports
Four ports on the left side for precursor / counter-reactant delivery
Purge gas
Separate nitrogen (N2) purge inlet at the rear
Manufacturer specifications
MOCVD System, Room 360

MOCVD System

Room 360 · Tube-furnace reactor

Metal-organic chemical vapor deposition for thin-film growth using metal-organic precursors.

Process
Metal-organic chemical vapor deposition (MOCVD)
Furnace
Lindberg/Blue M
CVD System, Room 360

CVD System

Room 360 · Tube-furnace reactor

Chemical vapor deposition for thin-film growth in a heated tube reactor.

Process
Chemical vapor deposition (CVD)
Furnace
Lindberg/Blue M
Supercritical CO2 High Pressure Synthesis Reactor, Room 360

Supercritical CO2 High Pressure Synthesis Reactor

Room 360

High-pressure synthesis using supercritical carbon dioxide (CO2).

Process
Supercritical CO2 synthesis

Metrology & Characterization

Hitachi S-3000N SEM, Room 341

Hitachi S-3000N SEM

Room 341 · Hitachi

Scanning electron microscopy for surface morphology and microstructural imaging.

Instrument
Scanning electron microscope (SEM)
Model
S-3000N

Supporting Equipment

TRESKY Die Bonder, Room 341

TRESKY Die Bonder

Room 341 · TRESKY

Die placement and bonding for device assembly and packaging.

Instrument
Die bonder
Application
Device assembly and packaging
MBRAUN UNIlab-B Glovebox, Room 341

MBRAUN UNIlab-B Glovebox

Room 341 · MBRAUN

An enclosed workspace for handling air- and moisture-sensitive materials.

Instrument
Glovebox
Model
UNIlab-B